Photoresists

 

Photoresist: AZ1505

Storage: Wet bench - bay 2
Type: Positive
Thickness Range: 4.0 - 7.0 kÅ
Product Data Sheet: AZ1505 Product Data Sheet
MSDS: AZ1505 MSDS
Developer: MF 319 Dev, 351 Dev:H2O (1:5)
Process: AZ1505 PDS

 

Photoresist: AZ 9260

Storage: Refrigerator - chase 2
Type: Positive
Thickness Range: 4.6 - 24µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: 1:4 AZ 400K:H2O
Process: 9µm38µm

 

Photoresist: Futurrex NR 71 1500P

Storage: Wet bench - bay 2
Type: Negative
Thickness Range: 1.1 - 3.1µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: Futurrex RD6
Process: RecipeSpeed vs. thickness

 

Photoresist: Futurrex NR 71 3000P

Storage: Wet bench - bay 2
Type: Negative (RIE/Ion mill)
Thickness Range: 2.1 - 6.3µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: Futurrex RD6
Remover: RR41 (PDS)
Process: RecipeSpeed vs. thickness

 

Photoresist: LOR 3A

Storage: Wet bench - bay 2
Type: Lift-off
Thickness Range: 3.5 - 5.0kÅ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF CD 26
Process: S1813 LOR3A

 

Photoresist: LOR 20B

Storage: Wet bench - bay 2
Type: Lift-off
Thickness Range: 1.8 - 3.8µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: 1:4 AZ 400K:H2O
Process: S1813 LOR20B

 

Photoresist: S1805

Storage: Wet bench - bay 2
Type: Positive
Thickness Range: 4.0 - 6.0kÅ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF 319 Dev, 351 Dev:H2O (1:5)
Process: S1800 process parameters

S1800 series resist spin speed vs. film thickness

 

Photoresist: S1813

Storage: Wet bench - bay 2
Type: Positive
Thickness Range: 1.3 - 1.8µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF 319 Dev, 351 Dev:H2O (1:5)

 

Photoresist: S1818

Storage: Wet bench - bay 2
Type: Positive
Thickness Range: 1.7 - 2.6µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: MF 319 Dev, 351 Dev:H2O (1:5)

 

Photoresist: SU8 2010

Storage: Wet bench - bay 2
Type: Negative
Thickness Range: 10 - 20µ
Product Data Sheet: PDS
MSDS: MSDS
Developer: SU8 Developer PM Acetate. SU8 Developer is not provided by the MNC.
Process: Dilution Tips